低压等离子体增强化学气相沉积法,LPPCVD
1)LPPCVD低压等离子体增强化学气相沉积法
1.α-C∶H thin films were deposited by low-pressure plasma chemical vapor deposition(LPPCVD)with H2(99.9999%的H2及反式-2-丁烯(T2B)为工作气体,利用低压等离子体增强化学气相沉积法制备了α-C∶H薄膜。
2)Low Temperature plasma enhance chemical vapour deposition低温等离子增强化学气相沉积
3)direct current-radio frequency plasma enhan- ced chemical vapor deposition偏压/射频耦合等离子体增强化学气相沉积
4)very-high-frequency plasma-enhanced chemical vapor deposition超高频等离子体增强化学气相沉积
1.Deposition of μc-Si:H films at a high rate was investigated usingvery-high-frequency plasma-enhanced chemical vapor deposition (VHF-PECVD) in this paper.采用超高频等离子体增强化学气相沉积(VHF-PECVD)技术,实现了微晶硅硅薄膜的高速沉积,并通过改变气体总流量改变气体滞留时间,考察了气体滞留时间在化学气相沉积(CVD)过程中对薄膜的生长速率以及光电特性和结构特性的影响。
5)Direct current plasma enhanced chemical vapour deposition直流等离子体增强化学气相沉积
6)PECVD等离子体增强化学气相沉积
1.The Effect of Repeated Ar~+ Bombardment on the Corrosion Resistance ofPlasma-enhanced Chemical Vapour Deposited (PECVD) TiN Film;循环氩离子轰击对等离子体增强化学气相沉积(PECVD)TiN膜耐腐蚀性能的影响
2.Facet Antireflection Coatings Deposited byPECVD;等离子体增强化学气相沉积端面减反膜的研究
3.High Quality ZnO Thin Films Grown byPECVDfrom Metal Organic Zinc and Carbon Dioxide Mixture Gas Sources;用锌金属有机源和二氧化碳等离子体增强化学气相沉积的方法制备高质量氧化锌薄膜
英文短句/例句
1.Study on Device of Magneto-active Plasma Enhanced Chemical Vapor Deposition;磁激活等离子体增强化学气相沉积设备的研制
2.The Study on DLC Films Deposited by PECVD;等离子体增强化学气相沉积DLC膜的研究
3.Study on Characteristic of Si_3N_4 Nanopowder Prepared by ICPECVD;ICP等离子体增强化学气相沉积制备纳米粉体氮化硅特性研究
4.The Study of the Deposition of SiO_2 Films with RF Cold Plasma at Atmospheric-pressure;常压射频低温等离子体增强化学气相沉积二氧化硅薄膜的研究
5.Synthesis and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;等离子体增强化学气相沉积制备碳纳米管及其表征
6.Preparation and Characterization of Carbon Nanotubes by Plasma-enhanced Chemical Vapor Deposition;等离子体增强化学气相沉积方法制备碳纳米管及其表征
7.Study of Porous Nanocrystalline TiO_2 Thin Film Deposited by Atmospheric Pressure Plasma-Enhanced Chemical Vapour Deposition常压等离子体增强化学气相沉积纳米晶TiO_2多孔薄膜的研究
8.Study on the Growth of Carbon Nitride Filims by PE-CVD and the Related Gas-phase Reaction;等离子体增强化学气相沉积法制备氮化碳薄膜及其气相反应过程研究
9.Fabrication of germanium inverse opal three-dimensional photonic crystal by Low Temperature Plasma Enhance Chemical Vapour Deposition fill techniques低温等离子体增强化学气相沉积填充法制备Ge反蛋白石三维光子晶体
10.The Effect of Bias on Low Pressure Plasma-Enhanced Chemical Vapour Deposition of TiO_2 Film and its Structure and Performance偏压对低气压等离子体增强化学气相沉积TiO_2薄膜的结构和性能的影响
11.Synthesis and Properties of Carbon-ZnO Composites by Plasma-enhanced Chemical Vapor Deposition等离子体增强化学气相沉积制备碳素/氧化锌复合材料及其特性的研究
12.Preparation of Diamond-like Carbon Film by Plasma Enhanced Chemical Vapor Deposition and Its Nano-mechanical Properties;等离子体增强化学气相沉积法制备类金刚石膜及其纳米力学性能研究
13.Study on device of magneto-active PECVD;磁激活增强等离子体化学气相沉积设备的研制
14.plasma activated chemical vapour deposition等离子体化学气相沉积
15.Mass spectrometry diagnosis in SiOx coating grown by PECVD plasma等离子增强化学气相沉积制备氧化硅薄膜的质谱诊断研究
16.Diamond thin films grown up by microwave plasma CVD微波等离子体化学气相沉积金刚石簿膜
17.WORKING PRINCIPLE OF MICROWAVE PLASMA CVD SET UP微波等离子体化学气相沉积装置的工作原理
18.TEM Study on Diamond Films Deposited by MPCVD;微波等离子体化学气相沉积金刚石薄膜的电子显微学分析
相关短句/例句
Low Temperature plasma enhance chemical vapour deposition低温等离子增强化学气相沉积
3)direct current-radio frequency plasma enhan- ced chemical vapor deposition偏压/射频耦合等离子体增强化学气相沉积
4)very-high-frequency plasma-enhanced chemical vapor deposition超高频等离子体增强化学气相沉积
1.Deposition of μc-Si:H films at a high rate was investigated usingvery-high-frequency plasma-enhanced chemical vapor deposition (VHF-PECVD) in this paper.采用超高频等离子体增强化学气相沉积(VHF-PECVD)技术,实现了微晶硅硅薄膜的高速沉积,并通过改变气体总流量改变气体滞留时间,考察了气体滞留时间在化学气相沉积(CVD)过程中对薄膜的生长速率以及光电特性和结构特性的影响。
5)Direct current plasma enhanced chemical vapour deposition直流等离子体增强化学气相沉积
6)PECVD等离子体增强化学气相沉积
1.The Effect of Repeated Ar~+ Bombardment on the Corrosion Resistance ofPlasma-enhanced Chemical Vapour Deposited (PECVD) TiN Film;循环氩离子轰击对等离子体增强化学气相沉积(PECVD)TiN膜耐腐蚀性能的影响
2.Facet Antireflection Coatings Deposited byPECVD;等离子体增强化学气相沉积端面减反膜的研究
3.High Quality ZnO Thin Films Grown byPECVDfrom Metal Organic Zinc and Carbon Dioxide Mixture Gas Sources;用锌金属有机源和二氧化碳等离子体增强化学气相沉积的方法制备高质量氧化锌薄膜
延伸阅读
低压1.物理学上指较低的压力。 2.较低的电压，通常指二百五十伏特以下的电压。 3.心脏舒张时血液对血管的压力。也叫舒张压。
